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[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - CMP defect reduction by micro-scratch control using new monitoring technique
Teck Leong Neo,, See Yen Shang,, Chuan Ming Chong,, Huang, M., Chih Ming Chen,, Fang Jen Hsu,Année:
2001
Langue:
english
DOI:
10.1109/issm.2001.962977
Fichier:
PDF, 270 KB
english, 2001