[IEEE 2010 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2010.12.6-2010.12.8)] 2010 International Electron Devices Meeting - A solution for an ideal planar multi-gates process for ultimate CMOS?
Monfray, S., Huguenin, J.-L., Martin, M., Samson, M.-P., Borowiak, C., Arvet, C., Dalemcourt, JF., Perreau, P., Barnola, S., Bidal, G., Denorme, S., Campidelli, Y., Benotmane, K., Leverd, F., Gouraud,Année:
2010
Langue:
english
DOI:
10.1109/IEDM.2010.5703339
Fichier:
PDF, 2.71 MB
english, 2010
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