[IEEE 2004 International Conference on Integrated Circuit Design and Technology - Austin, TX, USA (17-20 May 2004)] 2004 International Conference on Integrated Circuit Design and Technology (IEEE Cat. No.04EX866) - Atomic layer deposition of high-k thin films for gate and capacitor dielectrics
Senzaki, Y., Chatham, H., Park, S., Bartholomew, L., Lo, T., Okuyama, Y., Barelli, C., Tousseau, C., Fleming, T., Ford, B.Année:
2004
Langue:
english
DOI:
10.1109/icicdt.2004.1309960
Fichier:
PDF, 487 KB
english, 2004
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