[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference - Shimane, Japan (31 Oct.-2 Nov. 2001)] Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) - The double exposure strategy using OPC and simulation and the performance on wafer with sub-0.10 μm design rule in ArF lithography