[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Effects of SF/sub 6/ addition to O/sub 2/ plasma on polyimide etching in ECR plasma etcher