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[IEEE Technical Digest., International Electron Devices Meeting - San Francisco, CA, USA (11-14 Dec. 1988)] Technical Digest., International Electron Devices Meeting - New high transparent resist and process technology for KrF excimer laser lithography
Sasago, M., Endo, M., Tani, Y., Nakagawa, H., Hirai, Y., Nomura, N.Année:
1988
DOI:
10.1109/iedm.1988.32758
Fichier:
PDF, 502 KB
1988