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[IEEE 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Portland, OR, USA (28-30 Sept. 2004)] 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. - Infusion processing solutions for USJ and localized strained-Si using gas cluster ion beams
Hautala, J., Borland, J.Année:
2004
Langue:
english
DOI:
10.1109/rtp.2004.1441709
Fichier:
PDF, 1.27 MB
english, 2004