[IEEE 2005 IEEE VLSI-TSA. International Symposium on VLSI Technology (VLSI-TSA-TECH) - Hsinchu, Taiwan (25-27 April 2005)] IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech). - Effect of low-K dielectric material on 63nm MLC (multi-level cell) NAND flash cell arrays
Mincheol Park,, Jung-Dal Choi,, Sung-Hoi Hur,, Jong-Ho Park,, Joon-Hee Lee,, Jin-Taek Park,, Sel, J.-S., Jong-Won Kim,, Sang-Bin Song,, Jung-Young Lee,, Ji-Hwon Lee,, Suk-Joon Son,, Yong-SeAnnée:
2005
Langue:
english
DOI:
10.1109/vtsa.2005.1497073
Fichier:
PDF, 322 KB
english, 2005