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A two-step low pressure chemical vapour deposition process for the production of tungsten metal thin films
Baxter, David V., Chisholm, Malcolm H., Chuang, Shiow-HueyAnnée:
1998
Langue:
english
Journal:
Chemical Communications
DOI:
10.1039/a802202j
Fichier:
PDF, 41 KB
english, 1998