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[IEEE 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Albany, NY, USA (2009.09.29-2009.10.2)] 2009 17th International Conference on Advanced Thermal Processing of Semiconductors - Advances on 32nm NiPt Salicide process
Chen, Yi-Wei, Ho, Nien-Ting, Lai, Jerander, Tsai, T.C., Huang, C.C., Wu, J.Y., Ng, Ben, Mayur, A. J., Tang, Alex, Muthukrishnan, Shankar, Zelenko, Jeremy, Yang, HelenAnnée:
2009
Langue:
english
DOI:
10.1109/rtp.2009.5373433
Fichier:
PDF, 316 KB
english, 2009