Halogen etching of group 13–15 (3–5) semiconductors and its relevance to chemical–mechanical polishing. The reactions of dibromine, dichlorine and sodium hypochlorite with gallium arsenide and related materials
Mcghee, Laurence, Nicol, Irene, Peacock, Robert D., Robertson, Max I., Stevenson, Paul R., Winfield, John M.Volume:
7
Année:
1997
Langue:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/a706242g
Fichier:
PDF, 134 KB
english, 1997