Effect of Anion in Developer on Dissolution Characteristics of Photoresist
Yamaguchi, Atsumi, Kishimura, Shinji, Yamada, Yoshiaki, Nagata, HitoshiVolume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.195
Date:
January, 1991
Fichier:
PDF, 890 KB
1991