Regulation of Pattern Dimension as a Function of Vacuum Pressure: Alkyl Monolayer Lithography
Khatri, Om P., Sano, Hikaru, Murase, Kuniaki, Sugimura, HiroyukiVolume:
24
Langue:
english
Journal:
Langmuir
DOI:
10.1021/la8021613
Date:
October, 2008
Fichier:
PDF, 944 KB
english, 2008