32,2: The development of the new low resistive material bus-line process with super high aperture ratio for high resolution TFT-LCDs
Nakabu, Shigeo, Yano, Kouzou, Katayama, Mikio, Hirobe, Toshihiko, Tarui, Tetsuya, Hibino, Yoshitaka, Voutsas, TolisVolume:
30
Année:
1999
Langue:
english
DOI:
10.1889/1.1834130
Fichier:
PDF, 139 KB
english, 1999