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[IEEE 2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems - Shenzhen, China (2009.01.5-2009.01.8)] 2009 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems - A novel p+ Poly-SiGe Gate CMOS device
Jing Zhang,, Kaizhou Tan,, Siliu Xu,, Zhengfan Zhang,, Yukui Liu,, Guangbing Chen,, Kaicheng Li,, Heming Zhang,, Huiyong Hu,Année:
2009
Langue:
english
DOI:
10.1109/NEMS.2009.5068623
Fichier:
PDF, 4.31 MB
english, 2009