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[IEEE 2005 13th International Conference on Advanced Thermal Processing of Semiconductors - Santa Barbara, CA, USA (04-07 Oct. 2005)] 2005 13th International Conference on Advanced Thermal Processing of Semiconductors - Near-Ideal Implanted Shallow-Junction Diode Formation by Excimer Laser Annealing
Gonda, V., Burtsev, A., Scholtes, T.L.M., Nanver, L.K.Année:
2005
Langue:
english
DOI:
10.1109/RTP.2005.1613688
Fichier:
PDF, 3.61 MB
english, 2005