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Basic Experiment on Atmospheric-Pressure Plasma Etching with Slit Aperture for High-Efficiency Dicing of SiC Wafer
Sano, Yasuhisa, Nishikawa, Hiroaki, Aida, Kohei, Tangpatjaroen, Chaiyapat, Yamamura, Kazuya, Matsuyama, Satoshi, Yamauchi, KazutoVolume:
740-742
Langue:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.740-742.813
Date:
January, 2013
Fichier:
PDF, 301 KB
english, 2013