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[IEEE 2006 International Workshop on Junction Technology - Shanghai, China ()] 2006 International Workshop on Junction Technology - Simulating Enhanced Diffusion and Activation of Boron by Atomistic Model
Min Yu,, Xiao Zhang,, Liming Ren,, Huihui Ji,, Kai Zhan,, Ru Huang,, Xing Zhang,, Yangyuan Wang,, Jinyu Zhang,, Oka, H.Année:
2006
Langue:
english
DOI:
10.1109/IWJT.2006.220855
Fichier:
PDF, 3.73 MB
english, 2006