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Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography
Kulshreshtha, Prashant K, Maruyama, Ken, Kiani, Sara, Blackwell, James, Olynick, Deirdre L, Ashby, Paul DVolume:
25
Langue:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/25/31/315301
Date:
August, 2014
Fichier:
PDF, 1.93 MB
english, 2014