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Impact of plasma treatment on electrical properties of TiO 2 /RuO 2 based DRAM capacitor
Hudec, Boris, Hušeková, Kristína, Rosová, Alica, Šoltýs, Ján, Rammula, Raul, Kasikov, Aarne, Uustare, Teet, Mičušík, Matej, Omastová, Mária, Aarik, Jaan, Fröhlich, KarolVolume:
46
Langue:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/46/38/385304
Date:
September, 2013
Fichier:
PDF, 1.36 MB
english, 2013