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Annealing behavior of phosphorus in native oxide films on heavily phosphorus doped silicon
W.B. Ying, Y. Mizokawa, Y.B. Yu, Y. Kamiura, M. Iida, K. KawamotoVolume:
100-101
Année:
1996
Langue:
english
Pages:
5
DOI:
10.1016/0169-4332(96)00338-8
Fichier:
PDF, 392 KB
english, 1996