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Influence of ion-implantation on native oxidation of Si in a clean-room atmosphere
Fumiko Yano, Akiko Hiraoka, Toshihiko Itoga, Hisao Kojima, Keiichi Kanehori, Yasuhiro MitsuiVolume:
100-101
Année:
1996
Langue:
english
Pages:
5
DOI:
10.1016/0169-4332(96)00274-7
Fichier:
PDF, 365 KB
english, 1996