
Deposition and study of CVD—tungsten and molybdenum thin films and their impact on microelectronics technology
K.A. Gesheva, T.A. Krisov, U.I. Simkov, G.D. BeshkovVolume:
73
Année:
1993
Langue:
english
Pages:
4
DOI:
10.1016/0169-4332(93)90150-a
Fichier:
PDF, 312 KB
english, 1993