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Analysis of the depth profile of Fe-Si buried layers in Fe+-implanted Si wafer by soft X-ray emission spectroscopy
V.R. Galakhov, E.Z. Kurmaev, S.N. Shamin, L.V. Elokhina, Yu.M. Yarmoshenko, A.A. BukharaevVolume:
72
Année:
1993
Langue:
english
Pages:
5
DOI:
10.1016/0169-4332(93)90045-d
Fichier:
PDF, 401 KB
english, 1993