
Experimental study and computer simulation of aspect ratio dependent effects observed in silicon reactive ion etching
V.A. Yunkin, V.F. Lukichev, K.V. Rudenko, D. Fischer, E. VogesVolume:
30
Année:
1996
Langue:
english
Pages:
4
DOI:
10.1016/0167-9317(95)00260-x
Fichier:
PDF, 967 KB
english, 1996