Aperture effect in plasma etching of deep silicon trenches
M.K. Abachev, Yu.P. Baryshev, V.F. Lukichev, A.A. Orlikovsky, K.A. ValievVolume:
42
Année:
1991
Langue:
english
Pages:
3
DOI:
10.1016/0042-207x(91)90094-y
Fichier:
PDF, 195 KB
english, 1991