Hydrogen cleaning of silicon wafers. Investigation of the wafer surface after plasma treatment
J. Ramm, E. Beck, A. Zueger, A. Dommann, R.E. PixleyVolume:
228
Année:
1993
Langue:
english
Pages:
4
DOI:
10.1016/0040-6090(93)90555-4
Fichier:
PDF, 279 KB
english, 1993