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Mechanism for photosensitization of peroxopolytungstic acid film by substitution of niobium or tantalum for a part of the tungsten
Hiroshi Okamoto, Akira Ishikawa, Tetsuichi KudoVolume:
172
Année:
1989
Langue:
english
Pages:
1
DOI:
10.1016/0040-6090(89)90660-3
Fichier:
PDF, 136 KB
english, 1989