Plasma deposition of amorphous hydrogenated carbon films on III-V semiconductors
John J. Pouch, Joseph D. Warner, David C. Liu, Samuel A. AlterovitzVolume:
157
Année:
1988
Langue:
english
Pages:
8
DOI:
10.1016/0040-6090(88)90350-1
Fichier:
PDF, 363 KB
english, 1988