Deposition of silica films by the oxidation of silane in oxygen: I: The kinetics and physicochemical model of the process
L.L. Vasilyeva, V.N. Drozdov, S.M. Repinsky, K.K. SvitashevVolume:
55
Année:
1978
Langue:
english
Pages:
8
DOI:
10.1016/0040-6090(78)90052-4
Fichier:
PDF, 426 KB
english, 1978