Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit
Boto, Agedi N., Kok, Pieter, Abrams, Daniel S., Braunstein, Samuel L., Williams, Colin P., Dowling, Jonathan P.Volume:
85
Langue:
english
Journal:
Physical Review Letters
DOI:
10.1103/PhysRevLett.85.2733
Date:
September, 2000
Fichier:
PDF, 86 KB
english, 2000