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High-Performance Normally-Off ${\rm Al}_{2}{\rm O}_{3}/{\rm GaN}$ MOSFET Using a Wet Etching-Based Gate Recess Technique
Wang, Ye, Wang, Maojun, Xie, Bing, Wen, Cheng P., Wang, Jinyan, Hao, Yilong, Wu, Wengang, Chen, Kevin J., Shen, BoVolume:
34
Langue:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2013.2279844
Date:
November, 2013
Fichier:
PDF, 1.48 MB
english, 2013