Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water
Klug, Jeffrey A., Becker, Nicholas G., Riha, Shannon C., Martinson, Alex B. F., Elam, Jeffrey W., Pellin, Michael J., Proslier, ThomasVolume:
1
Année:
2013
Langue:
english
Journal:
Journal of Materials Chemistry A
DOI:
10.1039/C3TA12514A
Fichier:
PDF, 928 KB
english, 2013