Influence of the microwave plasma CVD reactor parameters on substrate thermal management for growing large area diamond coatings inside a 915MHz and moderately low power unit
Mallik, Awadesh K., Pal, Kalyan S., Dandapat, Nandadulal, Guha, Bichitra K., Datta, Someswar, Basu, DebabrataVolume:
30
Langue:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/j.diamond.2012.10.001
Date:
November, 2012
Fichier:
PDF, 1.24 MB
english, 2012
File converter
Plus de résultats de recherche
More benefits 
