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Improving mechanical robustness of ultralow-k SiOCH plasma enhanced chemical vapor deposition glasses by controlled porogen decomposition prior to UV-hardening
Urbanowicz, A. M., Vanstreels, K., Verdonck, P., Shamiryan, D., De Gendt, S., Baklanov, M. R.Volume:
107
Année:
2010
Langue:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3428958
Fichier:
PDF, 780 KB
english, 2010