SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Advances in roll-to-roll imprint lithography for display applications
Jeans, Albert, Almanza-Workman, Marcia, Cobene, Robert, Elder, Richard, Garcia, Robert, Gomez-Pancorbo, Fernando, Jackson, Warren, Jam, Mehrban, Kim, Han-Jun, Kwon, Ohseung, Luo, Hao, Maltabes, John,Volume:
7637
Année:
2010
Langue:
english
DOI:
10.1117/12.852268
Fichier:
PDF, 22.48 MB
english, 2010