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Fabrication of enhancement-mode AlGaN/GaN high electron mobility transistors using double plasma treatment
Lim, Jong-Won, Ahn, Ho-Kyun, Kim, Seong-il, Kang, Dong-Min, Lee, Jong-Min, Min, Byoung-Gue, Lee, Sang-Heung, Yoon, Hyung-Sup, Ju, Chull-Won, Kim, Haecheon, Mun, Jae-Kyoung, Nam, Eun-Soo, Park, Hyung-MVolume:
547
Langue:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.04.103
Date:
November, 2013
Fichier:
PDF, 1.25 MB
english, 2013