Erratum: âSilicide formation in the Ta/Ti/Si system by reaction of codeposited Ta and Ti with Si (100) and Si (111) substratesâ [J. Appl. Phys. 85, 1531 (1999)]
Pelleg, Joshua, Goldshleger, N.Volume:
87
Année:
2000
Langue:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.372059
Fichier:
PDF, 252 KB
english, 2000