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Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
Chhowalla, M., Teo, K. B. K., Ducati, C., Rupesinghe, N. L., Amaratunga, G. A. J., Ferrari, A. C., Roy, D., Robertson, J., Milne, W. I.Volume:
90
Année:
2001
Langue:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1410322
Fichier:
PDF, 1.44 MB
english, 2001