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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Lifetime and refurbishment of multilayer LPP collector mirrors
Feigl, Torsten, Perske, Marco, Pauer, Hagen, Fiedler, Tobias, Yulin, Sergiy, Kaiser, Norbert, Tünnermann, Andreas, Bowering, Norbert R., Ershov, Alex I., de Dea, Silvia, Hoffmann, Kay, La Fontaine, BrVolume:
8679
Année:
2013
Langue:
english
DOI:
10.1117/12.2015492
Fichier:
PDF, 1.70 MB
english, 2013