High Temperature Chemical Vapor Deposition of Alumina Using Aluminum Tri-isopropoxide and Oxygen Mixture
S. Blittersdorf, N. Bahlawane, B. Atakan, K. Kohse-HöinghausVolume:
628
Année:
2002
Pages:
1
DOI:
10.1002/1521-3749(200209)628:9/103.0.co;2-p
Fichier:
PDF, 47 KB
2002