Effects of electrical and temperature stress on polysilicon resistors for CMOS technology applications
Kong-Beng Thei, Hung-Ming Chuang, Sheng-Fu Tsai, Chun-Tsen Lu, Xin-Da Liao, Kuan-Ming Lee, Wen-Chau LiuVolume:
31
Année:
2002
Langue:
english
Pages:
8
DOI:
10.1006/spmi.2002.1048
Fichier:
PDF, 592 KB
english, 2002