
Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon
Akihisa Matsuda, Katsuhiko Nomoto, Yoshiaki Takeuchi, Atsushi Suzuki, Akimasa Yuuki, Jérôme PerrinVolume:
227
Année:
1990
Langue:
english
DOI:
10.1016/0039-6028(90)90390-t
Fichier:
PDF, 636 KB
english, 1990