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The Influence of NH[sub 4]F on the Etch Rates of Undoped SiO[sub 2] in Buffered Oxide Etch
Proksche, HaraldVolume:
139
Année:
1992
Langue:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2069249
Fichier:
PDF, 413 KB
english, 1992