Polyhedral Oligomeric Silsesquioxane Containing Copolymers for Negative-Type Photoresists
Ho-May Lin, Shi-Yin Wu, Pei-Yuan Huang, Chih-Feng Huang, Shiao-Wei Kuo, Feng-Chih ChangVolume:
27
Année:
2006
Langue:
english
Pages:
6
DOI:
10.1002/marc.200600363
Fichier:
PDF, 191 KB
english, 2006