Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passiviation of silicon
Boris Veith, Florian Werner, Dimitri Zielke, Rolf Brendel, Jan SchmidtVolume:
8
Année:
2011
Langue:
english
Pages:
313
DOI:
10.1016/j.egypro.2011.06.141
Fichier:
PDF, 275 KB
english, 2011