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Hydrogen entry behaviour of newly developed Al–Mg–Si coating produced by physical vapour deposition
Yoshihiko Kyo, A.P. Yadav, Atsushi Nishikata, Tooru TsuruVolume:
53
Année:
2011
Langue:
english
Pages:
3048
DOI:
10.1016/j.corsci.2011.05.036
Fichier:
PDF, 1.47 MB
english, 2011