
XRR and XPS studies of SiO2 thin films formed by r.f. magnetron sputtering
Kojima, Isao, Li, Boquan, Fujimoto, ToshiyukiVolume:
28
Langue:
english
Pages:
4
Journal:
Surface and Interface Analysis
DOI:
10.1002/(sici)1096-9918(199908)28:13.0.co;2-o
Date:
August, 1999
Fichier:
PDF, 136 KB
english, 1999