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[IEEE 2009 International Semiconductor Conference (CAS 2009) - Sinaia, Romania (2009.10.12-2009.10.14)] 2009 International Semiconductor Conference - Reactive ion etching for patterning high aspect ratio and nanoscale features
Avram, M., Avram, A., Comanescu, F., Popescu, A.M., Voitincu, C.Année:
2009
Langue:
english
Pages:
4
DOI:
10.1109/smicnd.2009.5336554
Fichier:
PDF, 750 KB
english, 2009