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Controlling boron diffusion during rapid thermal annealing with co-implantation by amphoteric impurity atoms
Makarevich, Yu. V., Komarov, F. F., Komarov, A. F., Mironov, A. M., Zayats, G. M., Miskevich, S. A.Volume:
76
Langue:
english
Pages:
3
Journal:
Bulletin of the Russian Academy of Sciences: Physics
DOI:
10.3103/s1062873812050164
Date:
May, 2012
Fichier:
PDF, 269 KB
english, 2012